Analysis of eddy current effects in an electron optical columnSOMEDA, Y; SOHDA, Y; SAITOU, N et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6651-6654, issn 0021-4922, 1Conference Paper

Etching for 0.15-μm-level patterns with low microloading effect using beam plasmas generated by gas puff plasma sourcesOOMORI, T; TAKI, M; NISHIKAWA, K et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6809-6814, issn 0021-4922, 1Conference Paper

Experimental verifications of an aerial image evaluation method and its application to studies of attenuated phase-shifting masksSHIMIZU, H; UESAWA, F; ODA, T et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6598-6604, issn 0021-4922, 1Conference Paper

Nanofabrication of Fresnel zone plates for X-ray focusingBACIOCCHI, M; DI FABRIZIO, E; GENTILI, M et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6758-6763, issn 0021-4922, 1Conference Paper

Nanofabrication of multilayer zone plates by helicon plasma sputteringKOIKE, M; SUZUKI, I. H.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6754-6757, issn 0021-4922, 1Conference Paper

SiO₂/poly-Si multilayered electron beam resist process for fabrication of ultrasmall tunnel junctionsWADA, T; HIRAYAMA, M; HARAICHI, S et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6961-6965, issn 0021-4922, 1Conference Paper

X-ray projection lithography using a Fresnel zone plateKOYAMA, N; TSUYUZAKI, H; KURODA, K et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6748-6753, issn 0021-4922, 1Conference Paper

Effect of Menthol on Detrusor Smooth-Muscle Contraction and the Micturition Reflex in RatsNOMOTO, Yoshiko; YOSHIDA, Akira; IKEDA, Satoshi et al.Urology (Ridgewood, NJ). 2008, Vol 72, Num 3, pp 701-705, issn 0090-4295, 5 p.Article

Combination effect of AC-7700, a novel combretastatin A-4 derivative, and cisplatin against murine and human tumors in vivoMORINAGA, Yoshihiro; SUGA, Yasuyo; EHARA, Sumiko et al.Cancer science. 2003, Vol 94, Num 2, pp 200-204, issn 1347-9032, 5 p.Article

An approach to a high-throughput e-beam writer with a single-gun multiple-path systemSHIMAZU, N; SAITO, K; FUJINAMI, M et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6689-6695, issn 0021-4922, 1Conference Paper

Analysis of deformation of X-ray mask membrane in aligner motionTAKAKI, R; TANAKA, A; MITSUI, S et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6720-6724, issn 0021-4922, 1Conference Paper

Desorption of Ga and As atoms from GaAs surface induced by slow multiply charged Ar ionsITABASHI, N; MOCHIJI, K; SHIMIZU, H et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6861-6865, issn 0021-4922, 1Conference Paper

Electron beam calibration method for character projection exposure system EX-8DSUNAOSHI, H; HATTORI, K; HASHIMOTO, S et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6679-6683, issn 0021-4922, 1Conference Paper

Electron beam writing techniques for fabricating highly accurate X-ray masksKISE, K; AYA, S; YABE, H et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6738-6742, issn 0021-4922, 1Conference Paper

Emission characteristics of ion-implanted silicon emitter tipsHIRANO, T; KANEMARU, S; TANOUE, H et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6907-6911, issn 0021-4922, 1Conference Paper

Heuristic method for phase-conflict minimization in automatic phase-shift mask designMONIWA, A; TERASAWA, T; NAKAJO, K et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6584-6589, issn 0021-4922, 1Conference Paper

Molecular dynamics simulations of metal clusters and metal deposition on metal surfacesKATAGIRI, M; KUBO, M; YAMAUCHI, R et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6866-6872, issn 0021-4922, 1Conference Paper

Monolayer nitrogen-atom distribution in ultrathin gate dielectrics by low-temperature low-thermal-budget processingLUCOVSKY, G; LEE, D. R; HATTANGADY, S. V et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6827-6837, issn 0021-4922, 1Conference Paper

Projection exposure with variable axis immersion lenses : a high-throughput electron beam approach to suboptical lithographyPFEIFFER, H. C.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6658-6662, issn 0021-4922, 1Conference Paper

Submicron gate-fitted superconducting junction using a two-dimensional electron gasTAKAYANAGI, H; AKAZAKI, T.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6977-6986, issn 0021-4922, 1Conference Paper

Thermal decomposition of dissolution inhibitor in chemically amplified resits during prebake processSAITO, S; KIHARA, N; WAKABAYASHI, H et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6774-6779, issn 0021-4922, 1Conference Paper

Aluminum reflow behavior in via-role filling investigated by molecular dynamics simulation and computer graphicsYAMAUCHI, R; ENDOU, A; KATAGIRI, M et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6842-6845, issn 0021-4922, 1Conference Paper

Coherence and structural design of free-standing gratings for atom-wave opticsROOKS, M. J; TIBERIO, R. C; CARTER, J. M et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6935-6939, issn 0021-4922, 1Conference Paper

Effect of adding CO₂ to CH₄/H₂ mixture for InGaAs/GaAs selective reactive ion etchingNIHEI, M; HARA, N; SUEHIRO, H et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6819-6823, issn 0021-4922, 1Conference Paper

Evaluation of acid diffusibility in a chemical amplification resist using acidic water-soluble filmWATANABE, H; SUMITANI, H; KUMADA, T et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6780-6785, issn 0021-4922, 1Conference Paper